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标题	Requirements Of E-beam Size And Position Accuracy For Photomask Of Sub-32 Nm Hp Device
网址	https://doi.org/10.1117/12.868174
DOI	10.1117/12.868174
其他	期刊：Proceedings of SPIE - The International Society for Optical Engineering 作者：J. Choi;S.H. Lee;H.B. Kim;B.G. Kim;S.-G. Woo;H.K. Cho 出版日期：2010
求助人	熠熠紫水晶在 2023-10-03 02:27:48 发布，悬赏 30 积分
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